Download GTU (Gujarat Technological University) BE/BTech (Bachelor of Engineering / Bachelor of Technology) 2018 Winter 7th Sem New 2170311 Biomedical Microsystems Previous Question Paper
1
Seat No.: ________ Enrolment No.___________
GUJARAT TECHNOLOGICAL UNIVERSITY
BE - SEMESTER ?VII (NEW) EXAMINATION ? WINTER 2018
Subject Code: 2170311 Date: 29/11/2018
Subject Name: Biomedical Microsystems
Time: 10:30 AM TO 01:00 PM Total Marks: 70
Instructions:
1. Attempt all questions.
2. Make suitable assumptions wherever necessary.
3. Figures to the right indicate full marks.
MARKS
Q.1 (a) What is difference in manufacturing process between MEMS and
microelectronics.
03
(b) Explain the statement ?The material structure type is greatly
in?uenced by the interatomic bonds and their completeness?.
04
(c) Explain with neat schematic different processes for manufacturing
Silicon on insulator (SOI) substrate. Why SOI is preferred in
manufacturing microelectronics devices?
07
Q.2 (a) Explain diffusion process used in material doping with equations. 03
(b) Explain Czochralski Growth Process with neat schematic. Also
explain role of segregation coefficient in Czochralski Growth
Process.
04
(c) With help of neat diagram explain evaporation and sputtering
processes used for Physical Vapor deposition.
07
OR
(c) Explain different type of etching processes with neat diagram.
Which process is most suitable for Bio-MEMS?
07
Q.3 (a) Explain Chemical Mechanical polishing techniques used for silicon
wafers.
03
(b) With help of neat diagrams explain the different types of
crystallographic orientation of silicon wafers.
04
(c) Explain lithography technique used for patterning in MEMS.
Mention difference between negative and positive resist.
07
OR
Q.3 (a) Explain Damascene process with different stages in development. 03
(b) Explain with neat diagram sacrificial surface micromachining. 04
(c) Explain Annealing process used in MEMS processing. 07
Q.4 (a) Explain SCREAM with process flow used in Bulk micromachining. 03
(b) ?The evaluation and selection of a fabrication process appropriate
for an application requires the assessment of a number of factors?-
Explain the statement.
04
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1
Seat No.: ________ Enrolment No.___________
GUJARAT TECHNOLOGICAL UNIVERSITY
BE - SEMESTER ?VII (NEW) EXAMINATION ? WINTER 2018
Subject Code: 2170311 Date: 29/11/2018
Subject Name: Biomedical Microsystems
Time: 10:30 AM TO 01:00 PM Total Marks: 70
Instructions:
1. Attempt all questions.
2. Make suitable assumptions wherever necessary.
3. Figures to the right indicate full marks.
MARKS
Q.1 (a) What is difference in manufacturing process between MEMS and
microelectronics.
03
(b) Explain the statement ?The material structure type is greatly
in?uenced by the interatomic bonds and their completeness?.
04
(c) Explain with neat schematic different processes for manufacturing
Silicon on insulator (SOI) substrate. Why SOI is preferred in
manufacturing microelectronics devices?
07
Q.2 (a) Explain diffusion process used in material doping with equations. 03
(b) Explain Czochralski Growth Process with neat schematic. Also
explain role of segregation coefficient in Czochralski Growth
Process.
04
(c) With help of neat diagram explain evaporation and sputtering
processes used for Physical Vapor deposition.
07
OR
(c) Explain different type of etching processes with neat diagram.
Which process is most suitable for Bio-MEMS?
07
Q.3 (a) Explain Chemical Mechanical polishing techniques used for silicon
wafers.
03
(b) With help of neat diagrams explain the different types of
crystallographic orientation of silicon wafers.
04
(c) Explain lithography technique used for patterning in MEMS.
Mention difference between negative and positive resist.
07
OR
Q.3 (a) Explain Damascene process with different stages in development. 03
(b) Explain with neat diagram sacrificial surface micromachining. 04
(c) Explain Annealing process used in MEMS processing. 07
Q.4 (a) Explain SCREAM with process flow used in Bulk micromachining. 03
(b) ?The evaluation and selection of a fabrication process appropriate
for an application requires the assessment of a number of factors?-
Explain the statement.
04
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2
(c) Give comparison between LIGA, Bulk micromachining, surface
micromachining and conventional machining.
07
OR
Q.4 (a) What is sensor noise? Explain white noise and power spectral
density function (PSD).
03
(b) Explain Electron tunneling transduction principle with neat
schematic.
04
(c) Write Diagnostic and Therapeutic Applications of Metal Nano
shells.
07
Q.5 (a) What are vascular targets? Explain delivery of diagnostic and
therapeutic agents to vascular targets.
03
(b) Explain tissue specific ZIP codes in blood vessels. 04
(c) Explain various Bio Sensing Principles and sensing methods. 07
OR
Q.5 (a) Explain optical properties of quantum dots. 03
(b) Describe the development of inorganic semiconductor quantum
dots(QD) probes for biological and medical applications.
04
(c) Explain Biosensors arrays and Implantable devices used in MEMS
applications.
07
*************
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This post was last modified on 20 February 2020