GUJARAT TECHNOLOGICAL UNIVERSITY
SEMESTER-IV(NEW) — EXAMINATION - SUMMER 2019
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Subject Code:2143904 Date:20/05/2019
Subject Name: Synthesis of Nanomaterials-II
Time:02:30 PM TO 05:00 PM Total Marks: 70
Instructions:
- Attempt all questions.
- Make suitable assumptions wherever necessary.
- Figures to the right indicate full marks.
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MARKS
Q.1 (a) Define Resist and give example of EBL resist. 03
(b) Write applications of E-beam Lithography. 04
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(c) Describe the Electron beam lithography. 07
Q.2 (a) Write basic principles of PLD technique. 03
(b) Give Applications of PLD technique. 04
(c) Explain pulse laser deposition technique. 07
OR
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(c) Describe advantages and disadvantages of PLD. 07
Q.3 (a) Write basic principle of E-beam lithography. 03
(b) Describe Vector Scan and Roaster Scan. 04
(c) Explain proximity effect in E-beam lithography. 07
OR
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Q.3 (a) What are secondary electrons in E-Beam Lithography? 03
(b) Explain beam focusing and alignment in EBL. 04
(c) Explain advantages and disadvantages of EBL. 07
Q.4 (a) Differentiate between positive and negative resist. 03
(b) Write note on alignment of nano elements in hybrid nanostructures. 04
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(c) Explain RF Plasma Chemical Method. 07
OR
Q.4 (a) Give the basic principles of RF plasma chemical method. 03
(b) Describe Ion-beam for deposition. 04
(c) Write note on application of RF Plasma method. 07
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Q.5 (a) Write basic principle of CVD techniques. 03
(b) Give applications of CVD technique. 04
(c) Describe any-one CVD technique. 07
OR
Q.5 (a) Write basic principle of PVD techniques. 03
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(b) Give applications of PVD technique. 04
(c) Describe any one PVD techniques. 07
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