Download GTU BE/B.Tech 2019 Summer 8th Sem New 2183901 Nanolithography Question Paper

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GUJARAT TECHNOLOGICAL UNIVERSITY
BE - SEMESTER-VII(NEW) EXAMINATION - SUMMER 2019

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Instructions:

1. Attempt all questions.

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2. Make suitable assumptions wherever necessary.
3. Figures to the right indicate full marks.

MARKS

1. (a) Define: Photoresist. 03
   (b) Differentiate between Positive and Negative photoresists. 04
   

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   (c) Explain basic process of Photolithography. 07
2. (a) What is resist soft bake? 03
   (b) Explain spin coating of resist. 04
   (c) Explain Acid-catalyzed DUV resist 07
   OR
   

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   (c) Explain Adhesion Promotion. 07
3. (a) Write basic principle of nanoimprint lithography. 03
   (b) Explain fabrication of mold for nanoimprint lithography. 04
   (c) Write note on X-ray Lithography. 07
   OR
   

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   (a) What is residual layer? 03
   (b) Explain separating the mold and resists after nanoimprint. 04
   (c) Write note on Nano-imprint Lithography. 07
4. (a) Write basic process of XRL. 03
   (b) Give differences between High Resolution and Deep XRL. 04
   

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   (c) Write a short note on X-ray source used for XRL. 07
   OR
   (a) What is resist hard bake? 03
   (b) Explain historical background leading to nanoimprint lithography. 04
   (c) Write applications of nanoimprint lithography. 07

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5. (a) Define negative resist and give examples. 03
   (b) Explain steps involved in preparation of resist for photolithography. 04
   (c) Write note on Applications of X-ray Lithography. 07
   OR
   (a) Define positive resist and give examples. 03
   

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   (b) Explain mask used for X-ray Lithography. 04
   (c) Write note on Applications of Photolithography. 07

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