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Roll No.
Total No. of Questions : 09
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Total No. of Pages : 02
B.Tech.(EE/Electrical & Electronics) (2011 Onwards E-I)
(Sem.-6)
MICROELECTRONICS TECHNOLOGY
Subject Code : BTEE-605F
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M.Code : 71157
Time: 3 Hrs.
Max. Marks : 60
INSTRUCTION TO CANDIDATES :
- SECTION-A is COMPULSORY consisting of TEN questions carrying TWO marks each.
- SECTION-B contains FIVE questions carrying FIVE marks each and students have to attempt any FOUR questions.
- SECTION-C contains THREE questions carrying TEN marks each and students have to attempt any TWO questions.
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SECTION-A
- Answer briefly :
- What is the difference between etching and deposition?
- Write chemical reaction for growth of SiO2.
- Draw the apparatus for CVD in formation of silicon.
- What do you mean by gettering?
- What do you mean by patterning?
- Why do we use GaAs for formation of IC?
- What do you mean by hybrid circuits?
- What is the use of Fick's two dimensional law?
- Write design rules for NMOS technology.
- Write the various apparatus names in reactive ion etching.
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SECTION-B
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- Discuss in detail about Fabrication of diodes, transistors, resistors and capacitors.
- Write the various peroxidation cleaning procedures.
- What are the various electrical properties of MOSFET?
- What do you mean by deposition?
- Draw layout for NAND and NOR gate.
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SECTION-C
- How can you design PLA?
- Discuss atomic diffusion mechanism.
- What are the fabrication steps for CMOS?
NOTE : Disclosure of Identity by writing Mobile No. or Making of passing request on any page of Answer Sheet will lead to UMC against the Student.
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This download link is referred from the post: PTU B.Tech 6th Semester Last 10 Years 2009-2019 Previous Question Papers|| Punjab Technical University
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